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Ultrafast Vibrational Dynamics and Stability of Deuterated Amorphous Silicon

Jon-Paul R. Wells, Ruud E. I. Schropp, Lex F. G. van der Meer, and Jaap I. Dijkhuis
Phys. Rev. Lett. 89, 125504 – Published 30 August 2002

Abstract

Infrared four-wave mixing experiments performed upon deuterated amorphous silicon layers (aSi:D) reveal profound differences in the dynamics of Si-D stretch vibrations compared to those of analogous Si-H vibrational modes in hydrogenated amorphous silicon (aSi:H). Remarkably, transient-grating measurements of the population decay rate of the Si-D vibrations show single-exponential decay directly into collective modes of the aSi host, bypassing the local bending modes of the defect into which the Si-H vibrations decay. Photon-echo measurements of the vibrational dephasing suggest at low temperature contributions from TO nonequilibrium phonons and at elevated temperatures elastic phonon scattering of TA phonons.

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  • Received 7 March 2002

DOI:https://doi.org/10.1103/PhysRevLett.89.125504

©2002 American Physical Society

Authors & Affiliations

Jon-Paul R. Wells1,*, Ruud E. I. Schropp2, Lex F. G. van der Meer1, and Jaap I. Dijkhuis2

  • 1Felix Free Electron Laser Facility, FOM—Institute for Plasmaphysics “Rijnhuizen,” P.O. Box 1207, 3430 BE, Nieuwegein, The Netherlands
  • 2Debye Institute, University of Utrecht, P.O. Box 80000, TA 3508 Utrecht, The Netherlands

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Issue

Vol. 89, Iss. 12 — 16 September 2002

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