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Atomic-Scale Sharpening of Silicon Tips in Noncontact Atomic Force Microscopy

V. Caciuc, H. Hölscher, S. Blügel, and H. Fuchs
Phys. Rev. Lett. 96, 016101 – Published 3 January 2006

Abstract

The atomic-scale stability of clean silicon tips used in noncontact atomic force microscopy (NC-AFM) is simulated by ab initio calculations based on density functional theory. The tip structures are modeled by silicon clusters with [111] and [001] termination. For the often assumed Si(111)-type tip we observe the sharpening of the initially blunt tip via short-range chemical forces during the first approach and retraction cycle. The structural changes corresponding to this intrinsic process are irreversible and lead to stable NC-AFM imaging conditions. In opposition to the picture used in literature, the Si(001)-type tip does not exhibit the so-called “two-dangling bond” feature as a bulklike termination suggests.

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  • Received 28 June 2005

DOI:https://doi.org/10.1103/PhysRevLett.96.016101

©2006 American Physical Society

Authors & Affiliations

V. Caciuc1, H. Hölscher1,2, S. Blügel3, and H. Fuchs1,2

  • 1Physikalisches Institut, Westfälische Wilhelms Universität Münster, Wilhelm-Klemm-Str. 10, 48149 Münster, Germany
  • 2Center for NanoTechnology (CeNTech), Gievenbecker Weg 11, 48149 Münster, Germany
  • 3Institut für Festkörperforschung (IFF), Forschungszentrum Jülich, 52425 Jülich, Germany

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Vol. 96, Iss. 1 — 13 January 2006

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