AlixLabs

"#ALDALE2024 Quite the line up in the front row of the plenary session earlier today. ALD and ALE Program Chairs and Co-chairs with plenary speakers. Listening in on the ALD Innovator Awardee talk by Annelies Delabie." From right to left: Mikko Ritala (University of Helsinki) Markku Leskelä (University of Helsinki) Ivo Raaijmakers (ASM), Fred Roozeboom (AlixLabs) Dmitry Suyatin (AlixLabs) Tuomo Suntola - The Inventor of ALD From Twitter: https://lnkd.in/e4FFnTqk Heather Korff

We would like to thank AlixLabs Advisors Fred Roozeboom and Jacques Kools for their fantastic support for us at the ALD ALE 2024 Conference in Helsinki! We were also happy to have you visit us in Lund on the way home and look forward to continued success together! Also in the photos: Asif Hassan Intu Sharma Dmitry Suyatin Reza Jafari Jam Jonas Sundqvist

We have had busy days in Helsinki presenting AlixLabs at the AVS ALD ALE 2024. Dmitry Suyatin and Fred Roozeboom has now handed over their Chairs to the Koreans for ALE 2025 - well done Gentlemen! Yoana Ilarionova gave a well received presentation on RFEA in ALE and we had great support by Jacques Kools and Jonas Klar (鍾可樂)

ASML has unveiled its revolutionary Hyper-NA EUV technology, set to transform semiconductor manufacturing by enabling unprecedented levels of transistor density. Announced by former president Martin van den Brink at imec's ITF World event in Antwerp, Hyper-NA boosts the numerical aperture (NA) from 0.55 to 0.75. This advancement promises enhanced productivity, processing 400 to 500 wafers per hour, and reduces the complexity and cost of double patterning. Intel has already adopted High-NA systems, and other industry leaders are expected to follow. Hyper-NA EUV sets a new benchmark for chip design, driving efficiency, innovation, and long-term growth in the semiconductor industry. ASML #Semiconductor #EUV #lithography https://lnkd.in/exbHvX_a

"ASML på väg att leverera första High-NA EUV-maskinen till TSMC. Trots kritik om höga kostnader och att tekniken inte behövs i närtid väntas TSMC få en första maskin under 2024." #halvledare https://lnkd.in/ezQMcfv2

AlixLabs is an Atomic Layer Etching (ALE) company. ALE’s integration with EUV lithography and patterning processes enhances the precision, selectivity, and overall quality of semiconductor manufacturing. By enabling atomic-scale control and reducing defects, ALE supports the production of advanced semiconductor devices with increasingly smaller feature sizes and more complex architectures. 🔔 For a fab manufacturing a 3 nm logic node wafer, lithography and etching contribute to 45% of the total CO2 footprint - we want to change that! 🔎 For detailed insights and specific examples, check out this recent review paper in JVSTA (Open Source): https://lnkd.in/eXba7YV3 #ALEtch #Lithography #semiconductors

"The AI-driven accelerated Computing revolution requires almost three times as much Silicon area as traditional design. #Nvidia is overcoming the die size limitation by attaching two dies on a silicon interposer. The blistering fast stacks of High-Bandwidth Memory also require more than double the silicon area than traditional DRAM." The market demand will be pulling hard as our APS(TM) technology can be deployed for patterning both advanced Logic and the HBM DRAM dies! Thank you Claus Aasholm for insightful information! https://lnkd.in/eP-SSrCe

A number of applications for APS(TM) can be seen here - it is all about packing narrow lines closely together at a small scale. Today ASML can do just below 10 nm dense lines - we aim beyond that! Basically, whatever ASML can do - we aim to split that in half. We want to bring back semiconductor manufacturing how it was at the 28 nm node - Litho - Etch including scaling - Litho -Etch & Split.

Amazing devotion to customers is celebrated at AlixLabs today, when FUERST Ralf from Oxford Instruments plc Upgrades the PLC on our Original Oxford Plasma Lab 100 ICP and we celebrate his 66 year birthday! We have named the machine Loki since it has proven to be quite a personality. Our second Oxford machine is more powerful and was named Thor. Amin Karimi Reza Jafari Jam

World Environment Day (WED) is an annual event celebrated on June 5th, organized by the United Nations (UN) to raise awareness and encourage action for the protection of the environment. Established in 1972 by the United Nations General Assembly during the Stockholm Conference on the Human Environment, World Environment Day has grown to become a global platform for public outreach, with participation from over 143 countries. AlixLabs' APS(TM) technology enhances environmental sustainability by improving energy efficiency, reducing material waste and carbon footprint, in future chip manufacturing. You may have heard about PFAS (Per- and Polyfluoroalkyl Substances) - Its an so called "forever chemical" with several severe implications for life in general and aquatic ecostystems - we try to avoid using or creating PFAS in our technology as there are alternatives and these are the areas we consider to improve and found alternative solutions for: 1. Photolithography: PFAS are used in photoresists and anti-reflective coatings during the photolithography process to create fine patterns on semiconductor wafers. 2. Etching and Cleaning: PFAS-based chemicals are employed in etching solutions and cleaning agents to remove unwanted material and contaminants from the wafer surfaces without damaging the delicate structures. 3. Plasma Processing: PFAS compounds are used in plasma-enhanced processes for their stability and effectiveness in etching and deposition. 4. Lubricants and Coolants: PFAS provide high-performance lubricants and coolants used in semiconductor manufacturing equipment to ensure smooth operation and heat dissipation.