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Article

A New Insight into the Influence of Fluid Inclusions in High-Purity Quartz Sand on the Bubble Defects in Quartz Glass: A Case Study from Vein Quartz in the Dabie Mountain

by
Shoujing Wang
1,2,3,
Deshui Yu
1,2,3,*,
Chi Ma
1,2,3,
Fushuai Wei
1,2,3 and
Haiqi Zhang
1,2,3
1
Zhengzhou Institute of Multipurpose Utilization of Mineral Resources, Chinese Academy of Geological Sciences, Zhengzhou 450006, China
2
China National Engineering Research Center for Utilization of Industrial Minerals, Zhengzhou 450006, China
3
Engineering Technology Innovation Center for Development and Utilization of High Purity Quartz, Ministry of Natural Resources, Zhengzhou 450006, China
*
Author to whom correspondence should be addressed.
Minerals 2024, 14(8), 794; https://doi.org/10.3390/min14080794
Submission received: 17 June 2024 / Revised: 30 July 2024 / Accepted: 30 July 2024 / Published: 1 August 2024
(This article belongs to the Section Crystallography and Physical Chemistry of Minerals & Nanominerals)
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Abstract

:
A purification process including flotation separation, acid leaching, calcination, and water quenching was conducted to obtain high-purity quartz sand. The surface morphology of the quartz after flotation separation, acid leaching, calcination, and water quenching reveals that the cracks, pits, and cavities on the quartz surface can be deepened and enlarged, and the more fluid inclusions, the greater the number and openness of cracks, pits, and cavities. The specific surface area is positively correlated with the number of cracks, pits, and cavities, the opacity of quartz glass, and the number of bubbles in quartz glass. The results of Raman spectroscopy analysis reveal that the bubbles in quartz glass are composed of nitrogen, which excludes the possibility of bubble formation in quartz glass caused by the gas composition (i.e., H2O) of unburst fluid inclusions in quartz sand. The formation of bubbles in quartz glass is more likely to be related to a high specific surface area and porosity, which increase the surface adsorption performance of quartz and contribute to the adsorption of more gas. The presented results suggest that using these methods to reduce the content of fluid inclusions in quartz cannot effectively solve the problem of bubbles in quartz glass, and using quartz raw materials with no or minor fluid inclusions is still the key to ensuring the quality of quartz products.

1. Introduction

Quartz is one of the most common minerals in nature. It is the main mineral component of crystal, agate, silica, etc., and is widely used in traditional industries such as glass, construction, and jewelry decoration [1]. Since the 1960s, computers, new materials, new energy, and other emerging technologies have put forward higher requirements for the purity of quartz products, giving birth to the concept of high-purity quartz (HPQ) [2,3,4]. However, different industries have different requirements for quartz quality [1]. Early studies have shown that the impurity content of HPQ should be less than 50 ppm, i.e., that the purity of SiO2 should be greater than 99.995% [2,5]. Vatalis et al. [6] suggested that quartz with a SiO2 purity of 99.95% and a total impurity content of <500 ppm is HPQ, quartz with a purity of 99.5% to 99.8% can meet the requirements of the semiconductor filler, optical fiber, and liquid crystal display screen production industries, and quartz with a purity of <99.5% can be used in the transparent glass industry. In recent years, emerging glass industries have reduced the purity requirements of SiO2 (quartz with a purity greater than 99.9% is high-purity quartz) [1,7,8,9]. HPQ is widely used in high-tech industries, such as optical fiber communications, photovoltaics, aerospace, and semiconductors due to its good optical properties, extremely low impurity content, excellent thermal stability, and corrosion resistance, and is an important green strategic resource [9,10,11,12,13,14,15,16]. At present, the raw materials used to produce HPQ are mainly from crystal, vein quartz, pegmatite quartz, and quartzite [1,9,17,18,19,20]. The global demand for HPQ raw materials is also increasing [17,21].
At present, there are two methods for the preparation of HPQ: one is synthesis, and the other is purification [22]. Nevertheless, due to the high cost of synthesis, the focus has shifted to the purification of natural quartz [9,23]. Natural quartz is often doped with impurities during the formation process, mainly including lattice impurity elements, mineral inclusions, and fluid inclusions [24,25,26]. Pure quartz is colorless and transparent, whereas trace impurities and inclusions can reduce its transparency and give it various colors [9]. The performance of HPQ products is highly dependent on the properties (i.e., impurities) of the raw materials. Thus, it is necessary to remove these impurities by crushing, grinding, sieving, gravity separation, magnetic separation, flotation separation, acid leaching, high-temperature calcination, and other methods to obtain HPQ sand or concentrate [9,21,23,27,28].
Different impurity elements have different effects on the performance of quartz; for example, Al affects the light conduction rate in quartz, and quartz with elevated P and B cannot be used in the photovoltaic industry [1]. Furthermore, trace metal impurities, such as Cr, Cu, Fe, Mn, and Ni, can migrate from crucible walls into silicon during the melting process, which reduces the light transmittance of quartz, increases fiber loss, and even causes signal distortion [1,23]. Trace alkalis, such as Na, K, and Li, also accelerate the dissolution of quartz vessels into pure silicon [23,29,30]. Thus, in the production of HPQ, it is necessary to purify the quartz raw material ore to reduce the content of impurity elements as much as possible. In addition, mineral inclusions contain numerous impurity elements, and their appearance usually reduces the purity of quartz [12].
Fluid inclusions are another type of impurity and are one of the most common and abundant inclusions in quartz [24,26,31]. They refer to the part of the substance in which the diagenetic and ore-forming fluids (aqueous fluids or silicate melts) are encapsulated in mineral lattice defects or cavities during the growth of minerals and still sequestered in the host mineral and have phase boundaries with the host mineral [12,31]. These fluid inclusions are generally composed of gas and liquid phases, although solid-phase substances can be seen in a small proportion of fluid inclusions. The gas-phase components are mainly H2O, CO2, and CH4, and the liquid-phase component is mainly H2O; most of them also dissolve certain amounts of metal cations (e.g., K+ and Na+) [31]. The accompanying solid phases are predominantly halite, sylvite, gypsum, and metallic mineral precipitates, as well as amorphous SiO2 and feldspars [31,32]. At present, research on the influence of fluid inclusions on HPQ products is mainly based on the belief that the existence of fluid inclusions will generate bubbles/vesicles during fusion processes and compromise both the mechanical and optical properties of the glass as well as affect their service life [33]. Calcination is currently the mainstream method for activating and removing fluid inclusions [34,35]. In general, 700 °C is considered to be the burst temperature for most fluid inclusions, but during heating from room temperature to 700 °C, quartz undergoes a phase transition (i.e., α-quartz to β-quartz), and deep fluid inclusions are not effectively removed [36]. However, the results of [11] show that calcination at 900 °C instead of 700 °C can effectively remove fluid inclusions in quartz, because when β-quartz transforms to β-tridymite, the quartz density change caused by microcracks is greater, and the activation energy for releasing fluid inclusions during the phase transition is greatly reduced. Most of the fluid inclusions in quartz can burst during calcination, after which water and other gases in them will quickly volatilize, and the metal cations in them can also be dissolved in water to be taken away during water quenching, thus forming cavities in their place. Nevertheless, as stated in [17], the most important quality indicator is not the content of fluid inclusions but the content of high-temperature impurity species, which are removed by heat treatment and determine the transparency and vesiculation of the fused glass. Kreisberg et al. [37] suggested that if the content of CO in fluid inclusions exceeds 15–20 ppm, dark spots will appear in the glass during fusion because of the interactions of graphite and silica inclusions in the melt. Some scholars hold the view that the main factor in the formation of quartz glass bubbles is the non-bursting fluid inclusions at high temperatures [38,39] or the fact that the fused silica formed in the outer layer encapsulates the incompletely melted quartz in the inner layer during the melting process, hindering the escape of the internal gas [40]. Moreover, the water in the inclusions can result in the formation of residual hydroxyl groups in quartz glass by the hydrolysis of Si-O bonds [41,42]. However, there are few studies on the relationship between fluid inclusions in quartz raw material and vesicles in quartz glass, especially the effect of fluid inclusions in raw material on bubble formation in quartz glass, which has still not been sufficiently investigated.
In this study, a series of processing steps, such as crushing, grinding, sieving, gravity separation, magnetic separation, flotation separation (FS), acid leaching (AL), and calcination and water quenching (CWQ), along with surface morphology observations, chemical analysis, density and specific surface area measurement, and Raman spectroscopy, were conducted on vein quartz samples, with the specific aim of providing a new understanding of the influence of fluid inclusions in HPQ sand on the vesiculation of quartz glass.

2. Materials and Methods

2.1. Sampling

Three vein quartz samples (A, B, C) from the Dabie Mountain area in Henan province, China, were collected. Samples A, B, and C are transparent (with minor fluid inclusions), semitransparent (with a moderate fluid inclusion content), and opaque (with a high fluid inclusion content), respectively. In addition, we used a photoelectric sorter to sort sample B, which was then divided into relatively transparent (D), semitransparent (E), and opaque (F). Concurrently, for comparison, a transparent vein quartz sample with the fewest fluid inclusions (G) from India was also collected. Firstly, the above seven vein quartz ores underwent crushing, grinding, and sieving to obtain 40–140-mesh samples. Secondly, gravity separation, magnetic separation, and flotation separation were conducted sequentially to remove minerals with high specific gravity, magnetic minerals, and non-magnetic minerals (e.g., mica and feldspar). The obtained quartz concentrates were used as raw materials in this study.

2.2. Acid Leaching Test

The quartz concentrates were placed inside a PTFE cup equipped with a mixed solution (75 g of deionized water, 15 mL of hydrochloric acid, 10 mL of nitric acid, and 10 mL of hydrofluoric acid). Subsequently, the PTFE cup containing the mixing reagent and sample was placed in a constant-temperature magnetic stirrer to maintain a temperature of 80 °C for 6 h. Finally, the samples were washed with deionized water and dried in an oven. The detailed procedures for acid leaching can be seen in Liu et al. [43].

2.3. Calcination and Water Quenching

After acid leaching, the samples were heated at 900 °C in a muffle furnace for 2 h and then directly soaked in deionized water for rapid cooling. After that, the samples were dried in a drying oven for analytical measurements and fused quartz glass preparation.

2.4. Trace Element Analysis

Trace element analysis was completed using inductively coupled plasma–optical emission spectroscopy (ICP-OES, iCAP 7400) (Thermo Fisher Scientific, Waltham, MA, USA) at the Zhengzhou Institute of Multipurpose Utilization of Mineral Resources, Chinese Academy of Geological Sciences, Zhengzhou, China. Prior to analysis, samples (1–2 g) were digested with a mixed solution (hydrofluoric acid, nitric acid, and polyol) in a PTFE beaker to ensure complete dissolution. After heating and drying, the samples were immersed in a mixture of deionized water and nitric acid in an FEP volumetric bottle for analysis.

2.5. Specific Surface Area and Density Analyses

Specific surface area measurement was conducted on a NOVA 3000E (Quantachrome, Boynton Beach, FL, USA) at the Zhengzhou Research Institute of Light Metal, Aluminum Corporation of China, Zhengzhou, China. Working conditions: 15–40 °C, relative humidity, and no vibration throughout the whole test. The density analysis was performed at the Zhengzhou Institute of Multipurpose Utilization of Mineral Resources, Chinese Academy of Geological Sciences, Zhengzhou, China.

2.6. Preparation of Quartz Glass

The quartz or silica glass samples were prepared by vacuum-compression melting at a temperature of 1900 °C and a pressure of 0.5 MPa. The crucible loaded with samples was placed in the sample chamber, and when the vacuum condition and 1900 ºC were reached, nitrogen was added to reach a pressure of 0.5 MPa, and this condition was maintained for 1 h before cooling.

2.7. Raman Spectroscopic Analysis of Bubbles in Quartz Glass

Raman spectroscopic analysis of the bubbles was carried out on the RENISHAW inVia Raman microspectrometer (Renishaw, Gloucestershire, UK) at the Xi’an Center of Geological Survey, China Geological Survey. An argon ion laser with a wavelength of 514.5 nm and a source power of 70 mW was used in detection. The spectral range for the analysis of gaseous-phase composition in the bubbles was 150–3000 cm−1. The slit of the spectrometer was 20 μm.

3. Results and Discussion

3.1. Surface Morphology of Quartz

For comparison, all seven vein quartz samples after FS and before AL, after AL and before CWQ, and after CWQ were selected to observe the variations in surface morphology or microstructure by scanning electron microscopy (SEM). The back-scattered electron (BSE) images of all seven samples are shown in Figure 1 and Figure 2.
As shown in Figure 1 and Figure 2, no matter the type of sample, with the increase in the degree of treatment or process (i.e., from FS through AL to CWQ), the number and opening degree of cracks, pits, and cavities also increase (e.g., Figure 1g–i). Interestingly, regardless of the type of treatment or process, the same trend is identified from samples G to A to B and finally to C, i.e., from the sample with the fewest inclusions to the sample with the most inclusions (e.g., Figure 1c,f,i,l). In detail, after FS and before AL, the surface of the quartz changes from smooth to porous from sample G to A to B and finally to C (Figure 1a,d,g,j); after AL and before CWQ, there are more and more cracks and pits on the surface of the quartz from sample G to A to B and finally to C (Figure 1b,e,h,k); after CWQ, an increased openness of cracks, pits, and cavities on the surface of the quartz from sample G to A to B and finally to C is observed (Figure 1c,f,i,l). It is worth noting that similar trends and characteristics are also shown from samples D through E to F (Figure 2).

3.2. Variations in Specific Surface Area, Density, and Trace Elements

The analysis results of the specific surface area, density, and trace elements of all seven samples after FS, AL, and CWQ are listed in Table 1 and Table 2. As can be seen from Table 1, the contents of impurity elements in almost all samples are below 100 ppm, with the exception of sample A. This indicates that sample A may contain mineral inclusions (e.g., muscovite), and the possibility of minor Al substituting Si in the quartz lattice cannot be ruled out. According to Table 2, on the premise that the particle size is similar between different samples, the specific surface area gradually increases from samples G to A to B and finally to C and from samples D to E to F, i.e., from a sample with a low fluid inclusion content to a sample with a high fluid inclusion content. However, the density exhibits the opposite trend, that is, gradually decreasing, which may be related to the low density of fluid inclusions.

3.3. Characteristics of Quartz Glass

In terms of transparency, quartz glass prepared with sample G is the most transparent, followed by sample A, then sample B, and finally sample C, which is consistent with the contents of fluid inclusions in the corresponding samples (Figure 3a–c,g). Moreover, the transparency also shows a decreasing trend from samples D through E to F (Figure 3d–f). In order to better understand the bubbles or vesicles in quartz glass, we used a stereomicroscope to observe the sectional characteristics of quartz glass. As can be seen in Figure 4a–c and g, the bubbles become more and more dense from samples G to A to B and finally to C. Similarly, from samples D to E to F, the number of bubbles also increases (Figure 4d–f).

3.4. The Gas Composition of Bubbles in Quartz Glass

The Raman spectra of the bubbles in quartz glass were obtained, as illustrated in Figure 5. The peaks of all the samples are roughly at 2329 cm−1, which is consistent with the nitrogen composition rather than the gas composition (i.e., H2O) of the fluid inclusions in quartz sand. Therefore, the possibility that vesiculation in quartz glass is caused by the gas composition of fluid inclusions in quartz sand is excluded.

3.5. Discussion

Previous studies have shown that as the temperature increases, the bond energy weakens, the atomic spacing becomes larger, and the thermal diffusivity of quartz increases, which eventually leads to the formation or increased openness of cracks [44,45,46,47]. As mentioned above, after AL and CWQ treatment, the number and openness of cracks, pits, and cavities are significantly increased. This is consistent with the findings by Lin et al. [14], Zhong et al. [16], Shao et al. [21], and [47], who found that cracks, pits, and cavities further grow after AL and CWQ. More importantly, whether in the FS process, AL process, or CWQ process, the surface morphology of quartz with an elevated fluid inclusion content is more porous than that of the surface of quartz with no or minor fluid inclusions (Figure 1 and Figure 2), which indicates that the fluid inclusions in quartz sand will make it characterized by porosity, especially after the fluid inclusions burst. This is because fluid inclusions will leave pits and cavities after bursting (Figure 6 and Figure 7). Furthermore, there is a positive correlation between the number of cracks, pits, and cavities, the specific surface area, the opacity of quartz glass, and the number of bubbles in quartz glass, suggesting that the porous structure is likely to increase the specific surface area of quartz and enhance its adsorption property.
The traditional view is that bubble defects in quartz glass are mainly caused by non-bursting fluid inclusions in quartz sand [31,32]. If this were the case, bubbles with vapor-phase water as the main component in quartz glass are expected. However, the bubble component in quartz glass is nitrogen, which excludes the influence of unburst fluid inclusions on vesiculation. In contrast, the formation of such bubbles is more likely to be due to a high specific surface area and porosity. In other words, a high specific surface area allows quartz to absorb more gas, which likely leads to the formation of bubbles in quartz glass. Consequently, cracks, pits, and cavities increase the specific surface area of quartz, which absorbs gas during the preparation of quartz glass, thus forming bubbles in quartz glass.

4. Conclusions

Surface morphology observations of quartz after flotation separation, acid leaching, calcination, and water quenching show that the cracks, pits, and cavities on the quartz surface can be deepened and enlarged, and the more fluid inclusions, the greater the number and openness of cracks, pits, and cavities. The porous structure of quartz increases its specific surface area (i.e., surface adsorption performance) and contributes to the adsorption of more gas, resulting in the formation of more bubbles or vesicles in quartz glass. Collectively, the results show that using these methods to reduce the content of fluid inclusions in quartz is not effective in solving the problem of bubbles in quartz glass, and in order to improve the quality of quartz products (e.g., reducing bubble defects), the use of high-purity quartz sand with no or minor fluid inclusions is still the most fundamental and critical factor.

Author Contributions

Conceptualization, S.W.; methodology, S.W. and F.W.; software, D.Y.; validation, S.W.; formal analysis, D.Y.; investigation, C.M. and H.Z.; resources, S.W.; data curation, C.M.; writing—original draft preparation, S.W. and D.Y.; writing—review and editing, S.W. and D.Y.; funding acquisition, H.Z. and D.Y.; visualization, S.W.; supervision, D.Y. All authors have read and agreed to the published version of the manuscript.

Funding

This work was financially supported by the National Natural Science Foundation of China and the China Geological Survey (No. U2344206), the National Natural Science Foundation of China (No. 42302105), and the Geological Survey Program of China Geological Survey (No. DD20243357).

Data Availability Statement

Data are contained within the article.

Acknowledgments

Special thanks are given to the editors and reviewers for their critical and constructive reviews that led to the improvement of the manuscript. We thank Weihua Shao, Guangxue Liu, Yameng Ma, Hongli Zhang, Qi Tan, and Yi Zhao for their efforts to maintain operation in related tests and experiments.

Conflicts of Interest

The authors declare no conflicts of interest.

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Figure 1. Back-scattered electron images of samples A, B, C, and G. (a) Sample A after FS and before AL; (b) sample A after AL and before CWQ; (c) sample A after CWQ; (d) sample B after FS and before AL; (e) sample B after AL and before CWQ; (f) sample B after CWQ; (g) sample C after FS and before AL; (h) sample C after AL and before CWQ; (i) sample C after CWQ; (j) sample G after FS and before AL; (k) sample G after AL and before CWQ; (l) sample G after CWQ.
Figure 1. Back-scattered electron images of samples A, B, C, and G. (a) Sample A after FS and before AL; (b) sample A after AL and before CWQ; (c) sample A after CWQ; (d) sample B after FS and before AL; (e) sample B after AL and before CWQ; (f) sample B after CWQ; (g) sample C after FS and before AL; (h) sample C after AL and before CWQ; (i) sample C after CWQ; (j) sample G after FS and before AL; (k) sample G after AL and before CWQ; (l) sample G after CWQ.
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Figure 2. Back-scattered electron images of samples D, E, and F. (a) Sample D after FS and before AL; (b) sample D after AL and before CWQ; (c) sample D after CWQ; (d) sample E after FS and before AL; (e) sample E after AL and before CWQ; (f) sample E after CWQ; (g) sample F after FS and before AL; (h) sample F after AL and before CWQ; (i) sample F after CWQ.
Figure 2. Back-scattered electron images of samples D, E, and F. (a) Sample D after FS and before AL; (b) sample D after AL and before CWQ; (c) sample D after CWQ; (d) sample E after FS and before AL; (e) sample E after AL and before CWQ; (f) sample E after CWQ; (g) sample F after FS and before AL; (h) sample F after AL and before CWQ; (i) sample F after CWQ.
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Figure 3. Photographs of quartz glass prepared from samples A (a), B (b), C (c), D (d), E (e), F (f), G (g).
Figure 3. Photographs of quartz glass prepared from samples A (a), B (b), C (c), D (d), E (e), F (f), G (g).
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Figure 4. Stereoscopic photographs of quartz glass sections of samples A (a), B (b), C (c), D (d), E (e), F (f), G (g).
Figure 4. Stereoscopic photographs of quartz glass sections of samples A (a), B (b), C (c), D (d), E (e), F (f), G (g).
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Figure 5. Raman spectra of the bubbles in quartz glass prepared from samples A (a), B (b), C (c), D (d), E (e), F (f), G (g).
Figure 5. Raman spectra of the bubbles in quartz glass prepared from samples A (a), B (b), C (c), D (d), E (e), F (f), G (g).
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Figure 6. Microscopic photographs of fluid inclusions in samples A, B, C, and G. (a) Sample A after FS and before AL; (b) sample A after AL and before CWQ; (c) sample A after CWQ; (d) sample B after FS and before AL; (e) sample B after AL and before CWQ; (f) sample B after CWQ; (g) sample C after FS and before AL; (h) sample C after AL and before CWQ; (i) sample C after CWQ; (j) sample G after FS and before AL; (k) sample G after AL and before CWQ; (l) sample G after CWQ.
Figure 6. Microscopic photographs of fluid inclusions in samples A, B, C, and G. (a) Sample A after FS and before AL; (b) sample A after AL and before CWQ; (c) sample A after CWQ; (d) sample B after FS and before AL; (e) sample B after AL and before CWQ; (f) sample B after CWQ; (g) sample C after FS and before AL; (h) sample C after AL and before CWQ; (i) sample C after CWQ; (j) sample G after FS and before AL; (k) sample G after AL and before CWQ; (l) sample G after CWQ.
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Figure 7. Microscopic photographs of fluid inclusions in samples D, E, and F. (a) Sample D after FS and before AL; (b) sample D after AL and before CWQ; (c) sample D after CWQ; (d) sample E after FS and before AL; (e) sample E after AL and before CWQ; (f) sample E after CWQ; (g) sample F after FS and before AL; (h) sample F after AL and before CWQ; (i) sample F after CWQ.
Figure 7. Microscopic photographs of fluid inclusions in samples D, E, and F. (a) Sample D after FS and before AL; (b) sample D after AL and before CWQ; (c) sample D after CWQ; (d) sample E after FS and before AL; (e) sample E after AL and before CWQ; (f) sample E after CWQ; (g) sample F after FS and before AL; (h) sample F after AL and before CWQ; (i) sample F after CWQ.
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Table 1. Analytical results of impurity elements in quartz samples after FS, AL, and CWQ (ppm).
Table 1. Analytical results of impurity elements in quartz samples after FS, AL, and CWQ (ppm).
SampleAlCaFeKMgNaTiBCrCuLiMnNiPZrTotal
A135.86 7.02 3.38 5.01 0.42 25.90 10.62 - - - 6.33 0.43 0.01 - - 194.98
B20.00 6.19 0.64 3.11 0.41 24.66 2.21 0.02 - 0.02 0.47 0.23 - 0.34 - 58.30
C40.28 2.21 0.54 6.83 0.35 27.25 0.64 0.48 0.03 - 0.13 0.04 0.13 0.01 0.39 79.31
D17.98 4.14 0.44 2.51 0.21 18.69 2.46 - - - 0.46 0.15 - - 0.05 47.09
E19.66 6.11 0.62 3.95 0.31 25.57 2.20 0.14 - - 0.42 0.25 - - - 59.23
F21.80 7.76 0.92 3.99 0.42 28.23 2.08 0.10 - 0.07 0.48 0.33 0.08 - 0.11 66.37
G14.74 0.05 0.80 4.86 0.31 0.24 1.10 - - - 0.11 0.03 0.09 - - 22.33
Note: “-” represents content below detection limit.
Table 2. Results of specific surface area (m2/g) and density (g/cm3) of different quartz samples that experienced FS, AL, and CWQ.
Table 2. Results of specific surface area (m2/g) and density (g/cm3) of different quartz samples that experienced FS, AL, and CWQ.
SampleABCDEFG
Specific surface area0.015 0.024 0.071 0.025 0.044 0.054 0.010
Density2.192 2.175 2.159 2.174 2.160 2.151 2.202
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Wang, S.; Yu, D.; Ma, C.; Wei, F.; Zhang, H. A New Insight into the Influence of Fluid Inclusions in High-Purity Quartz Sand on the Bubble Defects in Quartz Glass: A Case Study from Vein Quartz in the Dabie Mountain. Minerals 2024, 14, 794. https://doi.org/10.3390/min14080794

AMA Style

Wang S, Yu D, Ma C, Wei F, Zhang H. A New Insight into the Influence of Fluid Inclusions in High-Purity Quartz Sand on the Bubble Defects in Quartz Glass: A Case Study from Vein Quartz in the Dabie Mountain. Minerals. 2024; 14(8):794. https://doi.org/10.3390/min14080794

Chicago/Turabian Style

Wang, Shoujing, Deshui Yu, Chi Ma, Fushuai Wei, and Haiqi Zhang. 2024. "A New Insight into the Influence of Fluid Inclusions in High-Purity Quartz Sand on the Bubble Defects in Quartz Glass: A Case Study from Vein Quartz in the Dabie Mountain" Minerals 14, no. 8: 794. https://doi.org/10.3390/min14080794

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